30 Jul '13, 6pm

Water-Enabled Lithography Creates Long Graphene Nanoribbons

Water-Enabled Lithography Creates Long Graphene Nanoribbons

The research, which was published in the journal ACS Nano , (“Meniscus-Mask Lithography for Narrow Graphene Nanoribbons ”), essentially uses water as the mask in a lithography process that—when followed by ion etching—cuts up graphene into nanoribbons. The process does not require any high-resolution lithography tools—just atmospheric water collected at the edge of a lithography pattern.

Full article: http://spectrum.ieee.org/nanoclast/semiconductors/nanotec...

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