29 Nov '11, 2pm

Applied tips atomic-layer film treatment: "With the Onyx system, we're offering a unique treatment capability th...

SAN FRANCISCO—Semiconductor capital equipment vendor Applied Materials Inc. Tuesday (Nov. 29) announced a new atomic-layer film treatment that the company claims can reduce chip power consumption and lower the k-value of dielectric films by up to 20 percent. Applied (Santa Clara, Calif.) said its Producer Onyx film treatment system optimizes the molecular structure of the low-k films that insulate on-chip interconnects. According to Applied, interconnects account for about one-third of the total power consumed by a chip. Interconnect wires get pushed closer together with each successive technology node, increasing the potential for crosstalk between the adjacent lines, wasting power and restricting switching speeds, according to the company. Reducing capacitance by lowering the k-value of the insulating material that separates and supports interconnects improves performanc...

Full article: http://www.eetimes.com/electronics-news/4230957/Applied-t...

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